2T ultrapure water reverse osmosis equipment with EDI and polishing mixed bed, used in the semiconductor industry
I.Overview
The 2T/h Ultrapure Water Reverse Osmosis System with EDI and Polishing Mixed Bed is designed to meet the stringent water quality requirements of the semiconductor, electronics, and precision manufacturing industries.
It integrates pretreatment, RO, EDI, and mixed-bed polishing technology, ensuring continuous production of ultrapure water with resistivity up to 18.2 MΩ·cm. The system is compact, highly automated, and stable, making it ideal for critical industrial applications.
II.Key Features
Continuous ultrapure water production (up to 2,000 L/h).
Double-stage reverse osmosis + EDI + mixed-bed polishing for ultrahigh purity.
Automatic PLC control with online monitoring of conductivity, resistivity, and TOC.
Modular skid-mounted design for easy installation and maintenance.
Environmentally friendly – no acid/alkali regeneration required for EDI.
III.Technical Parameters
| Item | Specification |
| Model | 2T/h Ultrapure Water RO System with EDI & MB |
| Flow Rate | 2.0 m³/h (2000 L/h) |
| Raw Water | Tap water / softened water |
| Conductivity of Feed Water | ≤ 500 μS/cm |
| RO Recovery Rate | 60–70% |
| RO Desalination Rate | ≥ 98% |
| EDI Product Water Resistivity | 15–18 MΩ·cm |
| Final Polished Water Resistivity | Up to 18.2 MΩ·cm |
| TOC (Total Organic Carbon) | ≤ 10 ppb |
| Bacteria / Particles | < 1 CFU/mL; < 1 particle/mL |
| Control System | PLC + Touch Screen (Siemens / Schneider optional) |
| Frame Material | Stainless Steel 304/316L |
| Power Supply | 380V, 50Hz (customizable) |
IV.Flowchart
Raw Water Tank →Raw Water Pump →Multimedia Filter (Quartz Sand) →Activated Carbon Filter →Water Softener (optional, if raw water hardness is high) →Cartridge Filter (5μm PP) →High-Pressure Pump →Reverse Osmosis (1st Stage) →Reverse Osmosis (2nd Stage) →EDI (Electrodeionization Module) →Polishing Mixed Bed (Ion Exchange Resin) →UV Sterilizer + Precision Filter →Ultrapure Water Storage Tank →Distribution Pump + Loop Piping →Point of Use (Semiconductor Production Line)
ldentify needs
Clarify the following issues, you can determine the right equipment for you
Water quality problems
Example 1: sediment exceeds the standard / scale / turbid water / microbial exceeds the standard/ heavy metal exceeds the standard / money Yu exceeds the standard, etc.
Water standard
Example 1:Softened water/pure water/ultra-pure water/iron and manganese removal/sediment removal/sterilisation etc.
Daily Water Consumption
Example 1:Whether there is a concentrated water consumption period/water consumption time/peak maximum water consumption/hourly average water consumption
Conclusion Example
5 tonnes per hour water softening equipment.
3 tonnes per hour reverse osmosis water purification equipment
If you can't answer the above questions clearly?
1.Daily Water Consumption:Just mail a bottle of water sample
2.Water Standard:Just tell me your industry.
3.Water Consumption:We can help you to calculate the water consumption.
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2T Ultrapure Water RO System With EDI & Mixed Bed For Semiconductor Applications Images
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